首页> 外国专利> Preparing silicon ingots by solidifying a silicon melt, by providing a container for receiving a silicon melt, where the container comprises a bottom wall and a side wall, and arranging planar germ defaults on bottom wall of the container

Preparing silicon ingots by solidifying a silicon melt, by providing a container for receiving a silicon melt, where the container comprises a bottom wall and a side wall, and arranging planar germ defaults on bottom wall of the container

机译:通过提供一个用于容纳硅熔液的容器,通过固化硅熔液来制备硅锭,其中该容器包括底壁和侧壁,并在容器的底壁上排列默认的病菌

摘要

The method comprises providing a container for receiving a silicon melt, where the container comprises a bottom wall (2) and a side wall (3), arranging planar germ defaults (4) on the bottom wall of the container, where: the germ defaults have a side surface (6) and a crystal structure with a predetermined axial orientation; and side surfaces of the two neighboring germ defaults are separated from each other by a gap, arranging liquid silicon on the germ defaults, closing the gap between the germ defaults by a crystal growth, and directly solidifying the silicon melt in the container. The method comprises providing a container for receiving a silicon melt, where the container comprises a bottom wall (2) and a side wall (3), arranging planar germ defaults (4) on the bottom wall of the container, where: the germ defaults have a side surface (6) and a crystal structure with a predetermined axial orientation; and side surfaces of the two neighboring germ defaults are separated from each other by a gap, arranging liquid silicon on the germ defaults, closing the gap between the germ defaults by a crystal growth, and directly solidifying the silicon melt in the container. The germ defaults comprise a predetermined lateral orientation as axial orientation consisting of (100)-orientation and (110)-orientation. The germ defaults are arranged/located on the bottom wall of the container such that the germ defaults have a predetermined grain boundary configuration. The germ defaults comprise a crystal lattice with unit cells of a volume (VG), and the grain boundary configuration is selected in such a way that an unit cell of a coincidence lattice of two neighboring germ defaults has a volume (VK), where VK:VG is = 33. The silicon is arranged in the container in such a way that the gap between two neighboring germ defaults is 90% free from fixed silicon after arranging the silicon in the container and before solidifying the silicon melt. The gap has a breadth (B) and a depth (T), where T:B is = 2. The gap between two germ defaults is provided in a region of a subsequent saw line. An independent claim is included for a silicon ingot.
机译:该方法包括提供用于容纳硅熔体的容器,其中该容器包括底壁(2)和侧壁(3),在容器的底壁上布置平面病菌默认值(4),其中:病菌默认值具有侧面(6)和具有预定轴向取向的晶体结构;相邻的两个病原体的侧面彼此之间通过间隙隔开,在病原体上排列液态硅,通过晶体生长缩小病原体之间的间隙,并直接固化容器中的硅熔体。该方法包括提供用于容纳硅熔体的容器,其中该容器包括底壁(2)和侧壁(3),在容器的底壁上布置平面病菌默认值(4),其中:病菌默认值具有侧面(6)和具有预定轴向取向的晶体结构;相邻的两个病原体的侧面彼此之间通过间隙隔开,在病原体上排列液态硅,通过晶体生长缩小病原体之间的间隙,并直接固化容器中的硅熔体。病菌默认包括预定的横向取向作为轴向取向,轴向取向由(100)取向和(110)取向组成。病菌缺省物布置/定位在容器的底壁上,使得病菌缺省物具有预定的晶界构型。缺省病菌包括具有单位体积(VG)的晶格,并且以这样的方式选择晶界构型,使得两个相邻的缺省病菌的重合晶格的晶胞具有体积(VK),其中VK :VG> = 33。将硅布置在容器中的方式是,在将硅布置在容器中之后以及在固化硅熔体之前,两个相邻细菌默认值之间的间隙不含固定硅的90%。间隙具有宽度(B)和深度(T),其中T:B> =2。两个细菌默认值之间的间隙位于后续锯线的区域中。硅锭包含独立索赔。

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