首页> 外国专利> Detecting and monitoring contamination of optical component e.g. lens in apparatus for laser material processing, comprises projecting measuring beam emitted by light source at incident angle onto outer surface of optical component

Detecting and monitoring contamination of optical component e.g. lens in apparatus for laser material processing, comprises projecting measuring beam emitted by light source at incident angle onto outer surface of optical component

机译:检测和监控光学组件的污染,例如用于激光材料加工的设备中的透镜,包括将由光源发射的测量光束以入射角投射到光学组件的外表面上

摘要

The method comprises projecting a measuring beam (11) emitted by a light source at an incident angle onto an outer surface (5a) of an optical component (5), guiding a beam reflected from the outer surface of a protective glass under an angle of reflection corresponding to an angle of incidence by an aperture plate to a first light-sensitive detector (2) to detect an intensity of the reflected beam, and detecting an intensity of the diffused radiation scattered from the outer surface of the component under a scattering angle by a second light-sensitive detector. The method comprises projecting a measuring beam (11) emitted by a light source at an incident angle onto an outer surface (5a) of an optical component (5), guiding a beam reflected from the outer surface of a protective glass under an angle of reflection corresponding to an angle of incidence by an aperture plate to a first light-sensitive detector (2) to detect an intensity of the reflected beam, detecting an intensity of the diffused radiation scattered from the outer surface of the component under a scattering angle by a second light-sensitive detector, and determining a degree of contamination of the component from the detected intensity of the reflected beam and the scattered radiation. The method further comprises: detecting an intensity of a transmission beam transmitted by the optical component using a third light-sensitive detector (4);recording a performance of the measuring beam emitted by the light source via a monitor diode, where the degree of contamination of the optical component is detected from the detected intensity of the scattered radiation and the performance of the measuring beam; and readjusting the performance of the measuring beam emitted by the light source via a control device such that a signal detected by the first detector of the reflected beam independent of the degree of contamination of the optical component is kept constant. The measuring beam emitted from the light source is collimated, and strikes in a central region on the outer surface of the optical component. The detectors, with respect to the wavelength of the measuring beam, are wavelength-selective light-sensitive. A magnitude of the angle of incidence is equal to a magnitude of the angle of reflection. The angle of reflection and the scattering angle are different. An independent claim is included for an apparatus for detecting and monitoring a contamination of an optical component in an apparatus for laser material processing.
机译:该方法包括:将由光源发射的测量光束(11)以入射角投射到光学组件(5)的外表面(5a)上,以一定角度引导从保护玻璃外表面反射的光束。相应于光圈板入射到第一光敏检测器(2)的入射角的反射,以检测反射光束的强度,并检测在散射角下从组件外表面散射的散射辐射的强度由第二个光敏检测器。该方法包括:将由光源发射的测量光束(11)以入射角投射到光学组件(5)的外表面(5a)上,以一定角度引导从保护玻璃外表面反射的光束。相应于光圈板入射到第一感光检测器(2)的入射角的反射,以检测反射光束的强度,检测在散射角下从组件外表面散射的散射辐射的强度,第二光敏检测器,并根据检测到的反射光束和散射辐射的强度确定组件的污染程度。该方法还包括:使用第三光敏检测器(4)检测由光学部件透射的透射光束的强度;通过监控二极管记录由光源发出的测量光束的性能,其中污染的程度从检测到的散射辐射的强度和测量光束的性能来检测光学部件的位置;通过控制装置重新调整由光源发射的测量光束的性能,以使由第一检测器检测到的反射光束的信号与光学部件的污染程度无关,保持恒定。从光源发射的测量光束被准直,并入射到光学组件外表面的中心区域。相对于测量光束的波长,检测器对波长选择光敏感。入射角的大小等于反射角的大小。反射角和散射角不同。包括用于检测和监视用于激光材料加工的设备中的光学部件的污染的设备的独立权利要求。

著录项

  • 公开/公告号DE102012102785B3

    专利类型

  • 公开/公告日2013-02-21

    原文格式PDF

  • 申请/专利权人 JURCA MARIUS;

    申请/专利号DE201210102785

  • 发明设计人 JURCA MARIUS;

    申请日2012-03-30

  • 分类号B23K26/42;G01M11/02;G01N21/88;

  • 国家 DE

  • 入库时间 2022-08-21 16:21:50

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