Controlling energy for reactive sputtering, comprises e.g. applying voltage between target and counter electrode, where energy supply takes place at constant voltage and controller receives actual energy and is supplied as control variable

摘要

Controlling the energy for reactive sputtering, comprises applying a voltage between a target and a counter electrode, where the target receives actual energy by impedance between the target and a counter electrode, and controlling the flow rate of a reactive gas supplied during sputtering by a controller (2). The energy supply (1) takes place at a constant voltage and the controller receives the actual energy from the target and is supplied as a control variable. A energy target value is adjusted as a guidance variable at the controller and the reactive gas flow is adjusted by the controller. Controlling the energy for reactive sputtering, comprises applying a voltage between a target and a counter electrode, where the target receives actual energy by impedance between the target and a counter electrode, and controlling the flow rate of a reactive gas supplied during sputtering by a controller (2). The energy supply (1) takes place at a constant voltage and the controller receives the actual energy from the target and is supplied as a control variable. An energy target value is adjusted as a guidance variable at the controller, and the reactive gas flow is adjusted by the controller such that the deviation from energy set point and actual value of the energy is a minimum. The change in the target energy is tracked, when the energy provided to the target is delayed during a change in the target energy.