首页> 外国专利> Optical system i.e. micro-lithographic projection exposure system, for manufacturing e.g. LCD, has lenses arranged relative to each other such that delay distribution is partly compensated by voltage-induced double refraction distribution

Optical system i.e. micro-lithographic projection exposure system, for manufacturing e.g. LCD, has lenses arranged relative to each other such that delay distribution is partly compensated by voltage-induced double refraction distribution

机译:光学系统,即微光刻投影曝光系统,用于例如制造。 LCD具有彼此相对布置的透镜,从而延迟分布可以部分地由电压感应的双折射分布来补偿

摘要

The system has a set of lens groups (510, 520) including a set from two set of lenses (511, 512, 521, 522). One of the two set of lenses is made of cubic crystalline material e.g. fluoride crystal such as calcium fluoride, and comprises equal crystal section, and another set of lenses comprises voltage-induced double refraction is made of amorphous material i.e. quartz glasses. The two set of lenses are arranged relative to each other such that a delay distribution resulting for one of the lens groups is partly compensated by voltage-induced double refraction distribution. An independent claim is also included for a method for micro-lithographic manufacturing of micro-structured components.
机译:该系统具有一组透镜组(510、520),包括两组透镜(511、512、521、522)中的一组。两组透镜之一是由立方晶体材料制成的。氟化物晶体,例如氟化钙,并具有相等的晶体截面,另一组包括电压感应的双折射透镜是由非晶态材料即石英玻璃制成的。两组透镜相对于彼此布置,使得由一个透镜组产生的延迟分布被电压感应的双折射分布部分补偿。还包括用于微光刻制造微结构部件的方法的独立权利要求。

著录项

  • 公开/公告号DE102012213553A1

    专利类型

  • 公开/公告日2013-08-22

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT GMBH;

    申请/专利号DE201210213553

  • 发明设计人 SCHLESENER FRANK;SAENGER INGO;

    申请日2012-08-01

  • 分类号G02B27/28;G02B13/14;G03F7/20;G02B1/02;

  • 国家 DE

  • 入库时间 2022-08-21 16:21:41

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