首页> 外国专利> Cu-BASED MAGNETIC RECORDING ALLOY, SPUTTERING TARGET MATERIAL, AND PERPENDICULAR MAGNETIC RECORDING MEDIUM USING THE Cu-BASED MAGNETIC RECORDING ALLOY

Cu-BASED MAGNETIC RECORDING ALLOY, SPUTTERING TARGET MATERIAL, AND PERPENDICULAR MAGNETIC RECORDING MEDIUM USING THE Cu-BASED MAGNETIC RECORDING ALLOY

机译:铜基磁记录合金,溅射靶材和使用铜基磁记录合金的垂直磁记录介质

摘要

PROBLEM TO BE SOLVED: To provide a Cu-based magnetic recording alloy for a heat sink layer used for a thermally assisted magnetic recording medium, to provide a sputtering target material, and to provide a perpendicular magnetic recording medium using the Cu-based magnetic recording alloy.SOLUTION: A Cu-based magnetic recording alloy includes 1 to 23.4 atom% of one kind or two kinds or more of Cr, Mo and W, the balance of Cu and inevitable impurities. The Cu-based magnetic recording alloy also includes 0.2 to 5 atom% of one kind or two kinds or more of Al, Si, Zn, Mn and Ni. Further, the Cu-based magnetic recording alloy includes 0.1 to 1 atom% of one kind or two kinds or more of Y, La, Ce, Nb, Sm, Gd, Tb and Dy. A sputtering target material and a perpendicular magnetic recording medium include any of the Cu-based magnetic recording alloys.
机译:解决的问题:提供用于热辅助磁记录介质的散热层的铜基磁记录合金,溅射靶材以及使用该铜基磁记录的垂直磁记录介质。解决方案:铜基磁记录合金包含1至23.4原子%的Cr,Mo和W中的一种或两种或多种,​​余量的Cu和不可避免的杂质。 Cu基磁记录合金还包含0.2-5原子%的Al,Si,Zn,Mn和Ni中的一种或两种以上。此外,Cu基磁记录合金包括0.1至1原子%的Y,La,Ce,Nb,Sm,Gd,Tb和Dy中的一种或两种以上。溅射靶材料和垂直磁记录介质包括任何Cu基磁记录合金。

著录项

  • 公开/公告号JP2014118621A

    专利类型

  • 公开/公告日2014-06-30

    原文格式PDF

  • 申请/专利权人 SANYO SPECIAL STEEL CO LTD;

    申请/专利号JP20120276421

  • 发明设计人 MATSUBARA YOSHIAKI;SAWADA TOSHIYUKI;

    申请日2012-12-19

  • 分类号C22C9;C22C9/01;C22C9/04;C22C9/05;C22C9/06;C22C9/10;G11B5/738;G11B5/851;C23C14/34;

  • 国家 JP

  • 入库时间 2022-08-21 16:19:52

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