首页> 外国专利> MASK ASSEMBLY FOR INSPECTING VAPOR DEPOSITION ENVIRONMENT, VAPOR DEPOSITION INSTALLATION INCLUDING THE SAME, AND METHOD FOR INSPECTING VAPOR DEPOSITION ENVIRONMENT USING VAPOR DEPOSITION INSTALLATION

MASK ASSEMBLY FOR INSPECTING VAPOR DEPOSITION ENVIRONMENT, VAPOR DEPOSITION INSTALLATION INCLUDING THE SAME, AND METHOD FOR INSPECTING VAPOR DEPOSITION ENVIRONMENT USING VAPOR DEPOSITION INSTALLATION

机译:用于检查蒸气沉积环境的掩模组件,包括其的蒸气沉积安装以及使用蒸气沉积安装的蒸气沉积环境的检查方法

摘要

PROBLEM TO BE SOLVED: To provide a mask assembly capable of inspecting a vapor deposition environment for a plurality of vapor deposition sources with one inspection substrate.SOLUTION: A vapor deposition installation comprises: a plurality of vapor deposition sources; a vapor deposition chamber; a mask assembly for inspecting a vapor deposition environment; and a transfer part. The mask assembly for inspecting the vapor deposition environment comprises: a support member; a shutter member; and drive members. The support member has a first opening part through which vapor deposition materials sequentially enter, supports a base substrate on which the deposition materials are vapor-deposited, and moves in a first direction. The shutter member has a second opening part of which an area is smaller than that of the first opening part, and housed in the support member. The drive members change the positions of the second opening part with respect to the base substrate as the support member moves.
机译:解决的问题:提供一种掩模组件,该掩模组件能够利用一个检查基板来检查多个蒸气沉积源的蒸气沉积环境。气相沉积室;用于检查气相沉积环境的掩模组件;和转移部分。用于检查气相沉积环境的掩模组件包括:支撑构件;以及支撑构件。百叶窗构件;和驱动器成员。支撑构件具有第一开口部分,气相沉积材料顺序地进入该第一开口部分,支撑在其上气相沉积沉积材料的基础基板,并沿第一方向移动。活门构件具有第二开口部分,该第二开口部分的面积小于第一开口部分的面积,并且被容纳在支撑构件中。随着支撑构件的移动,驱动构件改变第二开口部分相对于基础基板的位置。

著录项

  • 公开/公告号JP2014051733A

    专利类型

  • 公开/公告日2014-03-20

    原文格式PDF

  • 申请/专利权人 SAMSUNG DISPLAY CO LTD;

    申请/专利号JP20130091080

  • 发明设计人 KIM MIN-HO;CHA YOU MIN;PARK SHAKUKAN;

    申请日2013-04-24

  • 分类号C23C14/24;H01L21/683;

  • 国家 JP

  • 入库时间 2022-08-21 16:19:04

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