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METHOD FOR DESIGNING ABUTMENT, AND METHOD FOR MANUFACTURING ABUTMENT

机译:胎头的设计方法和胎头的制造方法

摘要

PROBLEM TO BE SOLVED: To provide a method for designing an abutment that facilitates making an abutment and achieves a shape corresponding to individual circumstances of patients.;SOLUTION: A method is provided for designing an abutment based on a margin line height, a margin line maximum radius, an abutment height and an inclination angle. The margin line height H1 is a distance between a height measuring position 25 that is a position on a line connecting between a reference point 20 set on the gingival surface in the periphery of an embedded dental implant and an intraoral side end face of the dental implant, where a margin line has to be disposed, and the intraoral side end face of the dental implant. The margin line maximum radius R1 is a maximum distance of distances between the axis line of the dental implant and the height measuring position. The abutment height HA is a distance from an intraoral side end part to an oral cavity inside tip of the dental implant of the abutment to be mounted. The inclination angle θ1 is an angle formed by the abutment inclining to an axis line of the planting direction of the dental implant in the reference point direction.;COPYRIGHT: (C)2014,JPO&INPIT
机译:要解决的问题:提供一种设计基台的方法,该方法有助于制作基台并获得与患者的具体情况相对应的形状。;解决方案:提供了一种基于边界线高度,边界线设计基台的方法。最大半径,基台高度和倾斜角度。边缘线高度H 1 是高度测量位置25之间的距离,该高度测量位置25是在设置在埋入式牙植入物的外周中的牙龈表面上的参考点20之间的线上的位置上的距离。牙齿植入物的口腔内侧面(必须设置边缘线)和牙齿植入物的口腔内侧面。边缘线最大半径R 1 是牙科植入物的轴线与高度测量位置之间的最大距离。基台高度H A 是从口内侧端部到要安装的基台的牙齿植入物的尖端内部的口腔的距离。倾斜角θ 1 是基台在基准点方向上相对于种植牙种植方向的轴线倾斜而形成的角度。版权所有:(C)2014,JPO&INPIT

著录项

  • 公开/公告号JP2014155610A

    专利类型

  • 公开/公告日2014-08-28

    原文格式PDF

  • 申请/专利权人 CORE DENTAL LABO KK;GC CORP;

    申请/专利号JP20130028204

  • 发明设计人 KUGA MAKOTO;

    申请日2013-02-15

  • 分类号A61C8/00;

  • 国家 JP

  • 入库时间 2022-08-21 16:18:36

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