PRODUCTION METHOD OF LIGHT-SHIELDING MASK AND LIGHT-SHIELDING MASK, PRODUCTION METHOD OF NEUTRAL DENSITY FILTER AND NEUTRAL DENSITY FILTER, AND DRAWING METHOD CARRIED OUT IN THE PRODUCTION METHOD OF LIGHT-SHIELDING MASK

摘要

PROBLEM TO BE SOLVED: To more easily adjust a transmittance for light of a light-shielding film to a desired value.;SOLUTION: A drawing target substrate S1 is prepared, which is composed of a transparent substrate 10, a light-shielding film 11 formed on the transparent substrate 10, and a resist film 12 formed on the light-shielding film 11. Dots 12a having a dot density value corresponding to a desired transmittance for light of a light-shielding mask 1 are drawn on the resist film 12 with an electron beam B; the resist film 12 after dots are drawn is developed; the light-shielding film 11 is etched with an etching gas G by using the developed resist film 12 as an etching mask; and the remaining resist film 12 is removed.;COPYRIGHT: (C)2014,JPO&INPIT