Possessing the layered structure which was applied on the projection exposure device null substrate for the micro lithography which has the projection objective, and that kind of projection objective for the micro lithography which has the mirror and

摘要

And a hierarchical structure is applied to a substrate, the hierarchical structure comprises (P '', P '' ') sub-layer system of a plurality, each sub-layer system, the present invention is at least composed of individual layers of a series Configure a periodic arrangement of _{(2, P 3 P)} cycle 1, the _{(2, P 3 P)} cycle, the low refractive index layer (H '', H '' ') and the high refractive index layer (L (P '', P 'with respect'), different from the period thickness of the sub-layer system adjacent each sub-layer system and comprises a separate layer of the two consisting of different materials as a '') 'L,' ' with a _{(2, d 3 d)} of constant thickness which, on mirrors for EUV wavelength range. In the mirror, the number of (P ₂₎ period films' ('sub-layer system farthest from the substrate (P' ') sub-layer system far away to second from the substrate P) is,' (N ₂₎ and a number of (P ₃₎ higher cycle (N _3), and the thickness of the '(' 'H) high refractive index layer of the sub-layer system furthest away from the substrate (P' ')' and / or, wherein to be 0.1nm and very different thickness (H '') high refractive index layer of the sub-layer system further away from the second substrate. Projection objective lens for microlithography comprising such a mirror and the invention further relates to a projection exposure apparatus including a projection objective lens such.