首页> 外国专利> Calibration of the radiometric optical monitoring system is used for fault detection and process monitoring

Calibration of the radiometric optical monitoring system is used for fault detection and process monitoring

机译:辐射光学监控系统的校准用于故障检测和过程监控

摘要

The present invention is a method and system for radiometric calibration of the spectrometer for process monitoring and fault detection. (It is examined in the spectrum of known light source is traceable to the reference standard) reference spectrograph, is checked against the primary standard local. It is checked first by when viewing the same light source, spectrometer other, together for those from the reference spectrograph, and their outputs, then, the fine adjustment for narrowband light source plasma chamber is. Plasma chamber, or in the optical chamber is disposed along the interior of the chamber, the primary local standard can be placed temporarily in place. While being optically connected to the plasma chamber, the reference spectrograph, is checked against a primary standard local. Spectrometers other, is checked against a reference spectrograph while being connected to the plasma chamber, whereby the optical path of the reference for the entire spectrometer to test all of the elements. [Selection Figure Figure 2A
机译:本发明是一种用于光谱仪的辐射校准的方法和系统,用于过程监测和故障检测。 (在已知光源的光谱中检查是否可溯源到参考标准)参考光谱仪,是否与一级标准本地对照。首先,通过查看同一光源,其他光谱仪以及参考光谱仪中的光源及其输出进行检查,然后对窄带光源等离子体室进行微调。等离子室或在光学室中沿室的内部布置,主要的本地标准可以暂时放置在适当的位置。在光学连接到等离子体室的同时,对照主要光谱仪检查参考光谱仪。当光谱仪连接到等离子体室时,对照参考光谱仪检查其他光谱仪,从而整个光谱仪的参考光路可以测试所有元素。 [选择图图2A

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号