Positive-type radiation-sensitive composition, cured film, an interlayer insulating film, method of forming an interlayer insulating film, display device, and the siloxane polymer for the interlayer insulating film

摘要

PROBLEM TO BE SOLVED: To provide a polysiloxane positive-type radiation-sensitive composition which has high compatibility with a quinonediazide compound and with which an interlayer insulating film excellent in resistance to resist peeling liquid in an ITO film etching process can be formed.;SOLUTION: The positive-type radiation-sensitive composition contains (A) a siloxane polymer and (B) a quinone diazide compound, in which the content of aryl groups relative to Si atoms in the siloxane polymer (A) is greater than 60% by mole and no greater than 95% by mole. The siloxane polymer (A) may be a hydrolyzed condensate of a hydrolyzable silane compound including at least a compound expressed by expression (1) (in expression (1), R¹ expresses each independently a hydrogen atom, a 1-10C alkyl group, a 2-10C alkenyl group or a 6-15C aryl group. R² expresses each independently a hydrogen atom, a 1-6C alkyl group, a 1-6C acyl group or 6-15C aryl group. All or some of hydrogen atoms of the alkyl group, the alkenyl group and the alkyl group may be substituted. n is an integer of 0-3).;COPYRIGHT: (C)2011,JPO&INPIT