High temperature, high pressure and high temperature processing method, storage medium and high-pressure treatment apparatus

摘要

PROBLEM TO BE SOLVED: To prevent a corrosion of a processed object and a processed portion by performing a processing with an organic solvent having low moisture concentration supplied to the processed portion and the processed object.;SOLUTION: Isopropyl alcohol (IPA) is supplied from a supply source 30 of the IPA to a storage tank 3, and the IPA in the storage tank 3 is circulation-supplied through a circulation passage 32 having a moisture removal filter 4 and a concentration measurement part 5. Moisture is gradually removed from the IPA by the moisture removal filter 4 by circulating the IPA in the circulation passage 32. When moisture concentration measured by the concentration measurement part 5 is 0.01 weight% or less, the IPA is supplied to an intermediate tank 6. The IPA with moisture concentration 0.01 weight% or less is supplied from the intermediate tank 6 to a processing chamber 11, where a wafer W is processed with the IPA being in a high temperature and highly pressurized.;COPYRIGHT: (C)2012,JPO&INPIT