The being transparent optical section, the 1st semi- being transparent optical section and forming

摘要

PROBLEM TO BE SOLVED: To provide a multiple gradation photo-mask and a pattern transfer method to obtain a resist pattern with a steep profile.;SOLUTION: A multiple gradation photo-mask arranged on a transparent substrate 11 comprises a transfer pattern having a translucent portion and a semi-translucent portion by respectively pattern-processing a semi-translucent film transmitting exposure light partly. In the multiple gradation photo-mask, the semi-translucent portion comprises: a first semi-translucent film 12 having relatively low phase shift quantity in respect to the transparent substrate; and a second semi-translucent film 13 having relatively high phase shift quantity in respect to the first semi-translucent film 12.;COPYRIGHT: (C)2013,JPO&INPIT