P To provide a quality control method for facilitating feedback to a manufacture site and eliminating the need of updating a relational expression, to provide a manufacturing method of a semiconductor device to which the quality control method is applied and to provide a quality control system. PSOLUTION: In the quality control method of a product manufactured by at least one process and a multiple regression formula using measured values XSBi/SBacquired in processing processes A-D and inspection processes QC1 and QC2 as explanation variables as they are and using the characteristic value Y of the product as an objective variable is used. For instance, ON the basis of the multiple regression formula and the influence ON the variations in the characteristic values Y by the variations of the measured values XSBi/SBis calculated. Also, by substituting the measured value XSBi/SBrelating to a certain product in the multiple regression formula, ON the basis of a difference between the values of respective terms of the multiple regression formula relating to the product and the variance average and the size of the influence ON the characteristic value Y by the respective processes is evaluated. PCOPYRIGHT: (C)2009 and JPO& INPIT
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解决方案:在一种产品的质量控制方法中,至少使用一个过程和多元回归公式制造的产品,使用在过程AD和检查过程QC1和QC2中获得的测量值X i SB>作为解释变量照原样使用并且使用产品的特征值Y作为目标变量。例如,基于多元回归公式,计算出测量值X i SB>的变化对特性值Y的变化的影响。另外,通过将与某个乘积相关的测量值X i SB>代入多元回归公式中,基于与该乘积相关的多元回归公式的各个项的值与乘积之间的差。评估方差平均值和各个过程对特征值Y的影响大小。