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To run plasma chemical vapor deposition method produces the device and the optical preforming item in order the manner
To run plasma chemical vapor deposition method produces the device and the optical preforming item in order the manner
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机译:运行等离子体化学气相沉积法依次生产器件和光学预成型件
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摘要
PROBLEM TO BE SOLVED: To provide an apparatus for carrying out plasma chemical vapor deposition by which one or more layers of doped or undoped silica are deposited onto the interior of an elongated hollow glass substrate tube, and a method of manufacturing an optical preform by means of plasma chemical vapor deposition.;SOLUTION: Doped or undoped glass-forming gases are passed through the interior of an elongated glass substrate tube, whilst conditions such that deposition of glass layers takes place, are created in the interior of the substrate tube.;COPYRIGHT: (C)2009,JPO&INPIT
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