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To run plasma chemical vapor deposition method produces the device and the optical preforming item in order the manner

机译:运行等离子体化学气相沉积法依次生产器件和光学预成型件

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for carrying out plasma chemical vapor deposition by which one or more layers of doped or undoped silica are deposited onto the interior of an elongated hollow glass substrate tube, and a method of manufacturing an optical preform by means of plasma chemical vapor deposition.;SOLUTION: Doped or undoped glass-forming gases are passed through the interior of an elongated glass substrate tube, whilst conditions such that deposition of glass layers takes place, are created in the interior of the substrate tube.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种用于进行等离子体化学气相沉积的设备,通过该设备将一层或多层掺杂或未掺杂的二氧化硅沉积到细长的中空玻璃基板管的内部,以及通过该方法制造光学预制件的方法解决方案:掺杂或不掺杂的玻璃形成气体通过细长的玻璃基管的内部,同时在基管的内部产生了发生玻璃层沉积的条件。版权所有:(C)2009,日本特许厅&INPIT

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