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METHOD AND APPARATUS FOR MEASURING ALPHA PARTICLE INDUCED SOFT ERRORS IN SEMICONDUCTOR DEVICES
METHOD AND APPARATUS FOR MEASURING ALPHA PARTICLE INDUCED SOFT ERRORS IN SEMICONDUCTOR DEVICES
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机译:测量半导体装置中α粒子诱发的软错误的方法和装置
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摘要
An apparatus includes a probe card, an alpha particle source and a shutter. The probe card includes a plurality of contact elements. The contact elements define a measuring position. The shutter is arranged between the alpha particle source and the measuring position. The shutter is movable between a closed position and an open position. When the shutter is in the open position, alpha particles from the alpha particle source reach the measuring position. When the shutter is in the closed position, the alpha particles are blocked from reaching the measuring position.
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