DEPOSITION APPARATUS CAPABLE OF MEASURING RESIDUAL AMOUNT OF DEPOSITION MATERIAL AND METHOD OF MEASURING THE RESIDUAL AMOUNT OF THE DEPOSITION MATERIAL USING THE DEPOSITION APPARATUS

摘要

A deposition apparatus includes a process chamber including an observing window, a crucible disposed in the process chamber to overlap with the observing window in a first direction, a disc disposed between the observing window and the crucible to overlap with the observing window in the first direction and rotated with respect to the first direction, a rotation unit coupled to the process chamber and the disc to rotate the disc, a deposition preventing plate disposed between the disc and the crucible and provided with an opening formed therethrough and overlapped with the observing window in the first direction, and a measuring sensor disposed outside the process chamber to overlap with the observing window, the disc, and the crucible in the first direction. The measuring sensor senses a distance between the deposition material and the measuring sensor to measure a residual amount of the deposition material.