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Multi-layer photonic structures having omni-directional reflectivity and coatings incorporating the same

机译:具有全向反射率的多层光子结构以及包含该结构的涂层

摘要

A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer ≧1. The low index dielectric material may have an index of refraction nL from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nH from about 1.8 to about 3.5, wherein nHnL and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.
机译:多层光子结构可以包括具有[H(LH) N ]形式的高折射率材料和低折射率材料的交替层,其中,H是一层高折射率材料,L是一层N是低折射率材料层的对,N是高折射率材料层和低折射率材料层的对。 N可以是≥1的整数。低折射率电介质材料的折射率n L 可以为约1.3至约2.5。高折射率介电材料的折射率n H 可以从大约1.8到大约3.5,其中n H L 和对于相对于多层光子结构具有约0度至约80度的入射角的光,多层光子结构包括大于约200nm的反射率带。可以将多层光子结构结合到涂料或涂料体系中,从而形成全向反射涂料或涂料。

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