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Method for measuring wavefront aberration and wavefront aberration measuring apparatus

机译:波前像差的测定方法及波前像差测定装置

摘要

Providing a method for measuring wavefront aberration measured by detecting light that is emanated from a light source, incident on a test lens, and transmitted through the test lens, the method comprising steps of: measuring wavefront aberration in a state where an aperture stop of the test lens is fully opened; measuring a position of the center of a pupil of the test lens in a state where the aperture stop is stopped down; and expanding wavefront aberration by polynomials with making the position of the center of the pupil to be an origin, and a wavefront aberration measuring apparatus.
机译:提供一种用于测量波前像差的方法,该方法通过检测从光源发出,入射到测试透镜上并且透射过该测试透镜的光而测量,该方法包括以下步骤:在其中光阑的孔径光阑停止的状态下测量波前像差。测试镜头完全打开;在孔径光阑停止下来的状态下测量测试透镜的光瞳中心的位置;并且,以瞳孔中心的位置为原点,通过多项式来扩展波前像差,以及波前像差测量装置。

著录项

  • 公开/公告号US8836928B2

    专利类型

  • 公开/公告日2014-09-16

    原文格式PDF

  • 申请/专利权人 ISSEI TANAKA;

    申请/专利号US201013503028

  • 发明设计人 ISSEI TANAKA;

    申请日2010-10-19

  • 分类号G01J1/00;G01M11/02;

  • 国家 US

  • 入库时间 2022-08-21 16:05:09

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