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Reverse recovery using oxygen-vacancy defects

机译:使用氧空位缺陷进行反向恢复

摘要

A semiconductor device comprises a semiconductor substrate, a first electrode formed on a first main surface of the semiconductor substrate, and a second electrode formed on a second main surface of the semiconductor substrate. The semiconductor substrate includes a first region in which a density of oxygen-vacancy defects is greater than a density of vacancy cluster defects, and a second region in which the density of vacancy cluster defects is greater than the density of oxygen-vacancy defects.
机译:半导体器件包括:半导体衬底;形成在半导体衬底的第一主表面上的第一电极;以及形成在半导体衬底的第二主表面上的第二电极。半导体衬底包括其中氧空位缺陷的密度大于空位簇缺陷的密度的第一区域和其中空位簇缺陷的密度大于氧空位缺陷的密度的第二区域。

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