首页> 外国专利> Droplet-discharging-head manufacturing apparatus, droplet-discharging-head manufacturing method, droplet discharging head, droplet discharging device, and printing apparatus

Droplet-discharging-head manufacturing apparatus, droplet-discharging-head manufacturing method, droplet discharging head, droplet discharging device, and printing apparatus

机译:液滴排出头制造装置,液滴排出头制造方法,液滴排出头,液滴排出装置以及印刷装置

摘要

A droplet-discharging-head manufacturing apparatus that manufactures a droplet discharging head that includes a piezoelectric element formed by a laminated body of ferroelectric layers includes: a film forming unit that forms a ferroelectric precursor film on a silicon wafer having a conductive layer; a heating unit that heats and bakes the ferroelectric precursor layer to form the ferroelectric layer; a cooling unit that cools the ferroelectric layer; a conveying unit that conveys the silicon wafers one by one; and a control unit that controls the film forming unit, the heating unit, the cooling unit, and the conveying unit so as to repeat a series of processes including formation of the ferroelectric precursor layers by the film forming unit, heating of the ferroelectric precursor layers by the heating unit, and cooling of the ferroelectric layers by the cooling unit, for a predetermined number of times for each of the silicon wafers.
机译:一种液滴排放头制造设备,其制造包括由铁电层的层叠体形成的压电元件的液滴排放头,该设备包括:膜形成单元,其在具有导电层的硅晶片上形成铁电前体膜。加热单元,其加热并烘烤铁电前驱体层以形成铁电层。用于冷却铁电层的冷却单元;输送单元,其一个接一个地输送硅晶片。控制单元,其控制所述成膜单元,所述加热单元,所述冷却单元和所述输送单元,以重复进行包括通过所述成膜单元形成所述铁电前体层,加热所述铁电前体层的一系列处理。对于每个硅晶片,通过加热单元进行加热,然后通过冷却单元对铁电层进行冷却预定次数。

著录项

  • 公开/公告号US8684493B2

    专利类型

  • 公开/公告日2014-04-01

    原文格式PDF

  • 申请/专利权人 YUKITOSHI TAJIMA;KEIJI UEDA;

    申请/专利号US201213419800

  • 发明设计人 KEIJI UEDA;YUKITOSHI TAJIMA;

    申请日2012-03-14

  • 分类号B41J2/015;

  • 国家 US

  • 入库时间 2022-08-21 16:00:38

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