Layout fixing guideline system for double patterning odd cycle violations

摘要

Some embodiments of the invention provide a method for identifying and displaying odd loops and hints for resolution of the odd loops in an IC design layout for printing on multiple masks. The method of some embodiments identifies the hints by evaluating the effectiveness and feasibility of different potential resolutions, ensuring that hints do not create additional odd loops. The method of some embodiments also displays indications of the odd loops and the hints which a user can use to troubleshoot an odd loop violation. The method of some embodiments also prioritizes or scores the resolution hints to facilitate efficient troubleshooting of odd loop violations.