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Method of setting conditions for film deposition, photovoltaic device, and production process, production apparatus and test method for same
Method of setting conditions for film deposition, photovoltaic device, and production process, production apparatus and test method for same
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机译:设置膜沉积条件的方法,光伏器件及其生产工艺,生产设备和测试方法
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摘要
A photovoltaic device having a high conversion efficiency is produced in a stable manner. The conditions for film deposition of a microcrystalline silicon photovoltaic layer (4) in a photovoltaic device are set based on the Raman peak ratio within a Raman spectrum obtained at the substrate (1) side of the microcrystalline silicon layer (4), and the Raman peak ratio within a Raman spectrum obtained at the opposite side to the substrate (1).
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