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Methodology on developing metal fill as library device and design structure
Methodology on developing metal fill as library device and design structure
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机译:开发金属填充物作为库设备和设计结构的方法论
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摘要
A methodology is provided on developing metal fill as a library device and, in particular, a method of generating a model of the effects (e.g., capacitance) of metal fills in an integrated circuit and a design structure. The method is implemented on a computing device and includes generating a model for effects of metal fill in an integrated circuit. The metal fill model is generated prior to completion of a layout design for the integrated circuit.
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