VACUUM EQUIPMENT SYSTEM FOR SURFACE CLEANING AND OXIDATIVE MODIFICATION BY ULTRAVIOLET LIGHT/OZONE

摘要

A vacuum equipment system for surface cleaning and oxidative modification by ultraviolet light/ozone, comprising: a vacuum chamber, an ultraviolet light source (1), a sample holder (14), a vacuum system, an air pressure monitoring system, and a water cooling system (3); the vacuum equipment can be subdivided into a low-vacuum equipment system and a high-vacuum equipment system; the low-vacuum equipment is a single vacuum chamber having the ultraviolet light source (1) and the sample holder (14) disposed in the same chamber; the high-vacuum system is a dual vacuum chamber having the ultraviolet light source (1) located in an outer chamber (11) and the sample holder (14) located in an inner chamber (15); and the ultraviolet light source (1) radiates on the sample holder (14) in the inner chamber (15) through a quartz window (12). The present invention can effectively remove the air from a vacuum chamber before and after photoreaction, monitor the air pressure in the chamber, accurately control the material surface cleaning and oxidative modification process performed by ultraviolet light/ozone, and realize integration with other techniques, thus having significant application value in material surface cleaning and oxidative modification, as well as in in-situ characterization of the electrical properties of an electronic component.