首页> 外国专利> OPTICAL SYSTEM DESIGN METHOD BASED OTF FOR OPTICAL ENCODER HAVING DIFFERENT DISTANCES OF IMAGE AND OBJECT, AND OPTICAL ENCODER THEREOF

OPTICAL SYSTEM DESIGN METHOD BASED OTF FOR OPTICAL ENCODER HAVING DIFFERENT DISTANCES OF IMAGE AND OBJECT, AND OPTICAL ENCODER THEREOF

机译:图像和对象不同距离的基于OTF的光学系统设计方法及其光学编码器

摘要

An optical system design method of an optical encoder according to the present invention includes a step of receiving information on design condition about an optical system including a pupil lattice, an image lattice, and an object lattice and a step of determining an optical system structure according to the information on the design condition by determining a slit pitch of the object lattice, the slit pitch of the image lattice, the distance between the pupil lattice and the image lattice, and the distance between the pupil lattice and the object lattice based on the information on the design condition. The information on the design condition includes the information on a wavelength of irradiated light, the slit pitch of the pupil lattice, and a ratio between Z1, which is an object distance between the pupil lattice and the object lattice, and Z2, which is an image distance between the pupil lattice and the images lattice. The slit pitch of the object lattice and the slit pitch of the image lattice are determined by applying a modulation frequency of the object lattice and the reverse of a reverse modulation frequency of the image lattice. The Z1, which is an object distance between the pupil lattice and the object lattice, is the one selected among multiples on a modulation intensity change cycle, and the Z2, which is an image distance between the pupil lattice and the images lattice, is calculated according to the ratio on the Z1. [Reference numerals] (100) Control device;(102) User interface part;(104) Memory part;(106) Display controller;(108) Display module;(AA) Optical system designing part
机译:根据本发明的光学编码器的光学系统设计方法包括以下步骤:接收关于光学系统的设计条件的信息,该光学系统包括光瞳晶格,图像晶格和物镜晶格;以及确定光学系统结构的步骤。通过确定物体晶格的狭缝间距,图像晶格的狭缝间距,光瞳晶格和图像晶格之间的距离以及光瞳晶格和物体晶格之间的距离,获得关于设计条件的信息有关设计条件的信息。关于设计条件的信息包括关于照射光的波长,光瞳晶格的狭缝间距以及作为光瞳晶格和物体晶格之间的物距的Z1与作为光阑的Z2之间的比率的信息。光瞳晶格和图像晶格之间的图像距离。通过施加物体晶格的调制频率和图像晶格的反向调制频率的倒数来确定物体晶格的缝距和图像晶格的缝距。 Z1是光瞳晶格和物体晶格之间的物距,是在调制强度变化周期上的倍数中选择的一个,而Z2是光瞳晶格和图像晶格之间的像距。根据Z1上的比例。 [附图标记](100)控制装置;(102)用户界面部分;(104)存储器部分;(106)显示控制器;(108)显示模块;(AA)光学系统设计部分

著录项

  • 公开/公告号KR20130134059A

    专利类型

  • 公开/公告日2013-12-10

    原文格式PDF

  • 申请/专利权人 JUSTEK INC.;

    申请/专利号KR20120057308

  • 发明设计人 CHO KYU JUNG;

    申请日2012-05-30

  • 分类号G01D5/26;G01D5/347;

  • 国家 KR

  • 入库时间 2022-08-21 15:44:45

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