首页> 外国专利> METHOD TO DETERMINE A SUBJECT-SPECIFIC B1 DISTRIBUTION OF AN EXAMINATION SUBJECT IN A MEASUREMENT VOLUME IN THE MAGNETIC RESONANCE TECHNIQUE, MAGNETIC RESONANCE SYSTEM, COMPUTER PROGRAM, AND ELECTRONICALLY READABLE DATA MEDIUM

METHOD TO DETERMINE A SUBJECT-SPECIFIC B1 DISTRIBUTION OF AN EXAMINATION SUBJECT IN A MEASUREMENT VOLUME IN THE MAGNETIC RESONANCE TECHNIQUE, MAGNETIC RESONANCE SYSTEM, COMPUTER PROGRAM, AND ELECTRONICALLY READABLE DATA MEDIUM

机译:在磁共振技术,磁共振系统,计算机程序和电子可读数据介质中确定测量量的受试者特定B1分布的方法

摘要

Coating a substrate, comprises arranging a substrate to be coated over a cutting surface (2) of a target (1), atomizing the coating material by sputtering under an inert or reactive gas containing process gas and depositing on the substrate, where the coating is carried out using a mixed target having at least one first target component and a second target component and the beginning of the sputtering method is performed by modifying the distribution of target components in a superficial target layer (3) of the cutting surface by high energy pulsed magnetron. Coating a substrate, comprises arranging a substrate to be coated over a cutting surface (2) of a target (1), atomizing the coating material by sputtering under an inert or reactive gas containing process gas and depositing on the substrate, where the coating is carried out using a mixed target having at least one first target component and a second target component and the beginning of the sputtering method is performed by modifying the distribution of target components in a superficial target layer (3) of the cutting surface by high energy pulsed magnetron, preferably high power impulse magnetron sputtering (HiPIMS).
机译:涂覆基底,包括将待涂覆的基底布置在靶材(1)的切割表面(2)上,通过在包含工艺气体的惰性或反应性气体下通过溅射雾化涂覆材料,并沉积在基底上,其中涂层是使用具有至少一个第一靶组分和第二靶组分的混合靶进行的溅射方法的开始是通过利用高能量脉冲改变切割表面的表面靶层(3)中靶组分的分布来进行的磁控管。涂覆基底,包括将待涂覆的基底布置在靶材(1)的切割表面(2)上,通过在包含工艺气体的惰性或反应性气体下通过溅射雾化涂覆材料,并沉积在基底上,其中涂层是使用具有至少一个第一靶组分和第二靶组分的混合靶进行的溅射方法的开始是通过利用高能量脉冲改变切割表面的表面靶层(3)中靶组分的分布来进行的磁控管,最好是大功率脉冲磁控管溅射(HiPIMS)。

著录项

  • 公开/公告号KR20130135776A

    专利类型

  • 公开/公告日2013-12-11

    原文格式PDF

  • 申请/专利权人 SIEMENS AKTIENGESELLSCHAFT;

    申请/专利号KR20130062491

  • 发明设计人 SPECKNER THORSTEN;KOEHLER MICHAEL;

    申请日2013-05-31

  • 分类号G01R33/38;G01R33/20;A61B5/055;

  • 国家 KR

  • 入库时间 2022-08-21 15:44:46

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