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METHOD TO DETERMINE A SUBJECT-SPECIFIC B1 DISTRIBUTION OF AN EXAMINATION SUBJECT IN A MEASUREMENT VOLUME IN THE MAGNETIC RESONANCE TECHNIQUE, MAGNETIC RESONANCE SYSTEM, COMPUTER PROGRAM, AND ELECTRONICALLY READABLE DATA MEDIUM
METHOD TO DETERMINE A SUBJECT-SPECIFIC B1 DISTRIBUTION OF AN EXAMINATION SUBJECT IN A MEASUREMENT VOLUME IN THE MAGNETIC RESONANCE TECHNIQUE, MAGNETIC RESONANCE SYSTEM, COMPUTER PROGRAM, AND ELECTRONICALLY READABLE DATA MEDIUM
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机译:在磁共振技术,磁共振系统,计算机程序和电子可读数据介质中确定测量量的受试者特定B1分布的方法
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摘要
Coating a substrate, comprises arranging a substrate to be coated over a cutting surface (2) of a target (1), atomizing the coating material by sputtering under an inert or reactive gas containing process gas and depositing on the substrate, where the coating is carried out using a mixed target having at least one first target component and a second target component and the beginning of the sputtering method is performed by modifying the distribution of target components in a superficial target layer (3) of the cutting surface by high energy pulsed magnetron. Coating a substrate, comprises arranging a substrate to be coated over a cutting surface (2) of a target (1), atomizing the coating material by sputtering under an inert or reactive gas containing process gas and depositing on the substrate, where the coating is carried out using a mixed target having at least one first target component and a second target component and the beginning of the sputtering method is performed by modifying the distribution of target components in a superficial target layer (3) of the cutting surface by high energy pulsed magnetron, preferably high power impulse magnetron sputtering (HiPIMS).
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