It discloses an electronic device using a ribbon-method for preparing a ribbon manufactured by the above method graphene nano-gradient using a plasma etching technique, a large-area graphene nano-ribbons, and the graphene nano. Disclosed graphene nano-method for preparing a ribbon, by mesa etching the substrate to form a plurality of grooves and protrusions, forming an oxidized graphene thin layer on a substrate, the oxidation by means of reactive ion etching (RIE) method tilt the substrate So by reducing the graphene oxide thin pin in etching the thin film layer, and the remaining one side of the projection graphene nano-may comprise the steps of forming a ribbon. At this point, graphene nano-ribbons, depending on the width of the graphene nano-ribbons can have the energy band gap. ; 展开▼