首页> 外国专利> Apparatus for measureing drop mass deviation and controlling method of thereof and pattern forming system using thereof and controlling method of pattern forming system using thereof

Apparatus for measureing drop mass deviation and controlling method of thereof and pattern forming system using thereof and controlling method of pattern forming system using thereof

机译:用于测量液滴质量偏差的装置及其控制方法,使用该装置的图案形成系统以及使用该装置的图案形成系统的控制方法

摘要

The present invention is formed droplet mass deviation measuring device and its liquid mass deviation measurement method and system using the same pattern, and it relates to a control system using the method of pattern formation, an object of the present invention a plurality of liquid discharge unit can be measured in real time from the mass difference of the droplets to be discharged and needs to have high accuracy droplet to be discharged from a plurality of liquid discharge unit to provide a method for the control of the liquid mass deviation measurement device and its mass deviation measurement method and this system, and the pattern formed using the pattern forming system using the same capable of measuring the mass variation, even if having a diameter. Drop mass variation according to the invention for this purpose the measuring device has a plurality of liquid droplet to be discharged from each of a plurality of liquid discharge unit; Wherein the plurality of the plurality of droplet ejection direction and the moving force of the liquid movement force in the other direction separately providing a service; The plurality of droplet position ever sat chulaek position sensing element to obtain the droplet position the image is reflected separately; The SAT chulaek enemy position direction of the plurality of droplet ejection of droplets using the droplet position is obtained in the image sensing member by calculating misorientation include liquid mass deviation measurement control section for measuring the plurality of the droplet mass variation.
机译:本发明涉及使用相同图案形成的液滴质量偏差测量装置及其液体质量偏差测量方法和系统,并且涉及一种使用图案形成方法的控制系统,本发明的目的是多个液体排出单元可以从要排放的液滴的质量差实时测量,并且需要具有高精度的要从多个液体排放单元排放的液滴,以提供一种控制液体质量偏差测量装置及其质量的方法偏差测量方法和该系统,以及使用该图案形成系统形成的图案,即使具有直径,也能够测量质量变化。为此目的,根据本发明的液滴质量变化,测量装置具有从多个液体排出单元中的每一个排出的多个液滴。其中,所述多个液滴的喷射方向和所述多个液体在另一方向上的移动力分别提供服务;多个液滴位置一直保持在楚拉克位置感测元件上,以获得分别反射图像的液滴位置;通过计算取向差包括液体质量偏差测量控制部分,用于测量多个液滴质量变化,从而在图像感测构件中获得使用液滴位置的多个液滴喷射的SAT chulaek敌人位置方向。

著录项

  • 公开/公告号KR101339987B1

    专利类型

  • 公开/公告日2013-12-10

    原文格式PDF

  • 申请/专利权人

    申请/专利号KR20070136629

  • 申请日2007-12-24

  • 分类号H01L21/66;H01L21/027;

  • 国家 KR

  • 入库时间 2022-08-21 15:44:06

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