BLAST PROCESSING EQUIPMENT FOR PROCESSING SUBSTRATE PERIPHERAL PORTION AND BLAST PROCESSING METHOD BY USING THE EQUIPMENT

摘要

The present invention provides a blast processing device and a blast processing method which has a short processing time than a processing device and improved productivity. The present invention relates to a blast processing device (10) which eliminates a thin film layer of a substrate peripheral portion on a substrate (S) in which the thin film layer is formed. The blast processing device (10) comprises: a substrate peripheral portion processing room in which a substrate inserting unit (12e) to insert the substrate peripheral portion is formed; a nozzle (N) which is arranged to be inserted inside the substrate peripheral portion processing room and spraying a spraying material to the substrate peripheral portion inserted into the substrate inserting unit (12e); a spraying material supply tool (18) which is connected to the nozzle (N) and arranged on the upper side of the nozzle (N); a substrate peripheral portion processing tool (12) which includes a dust collector connected to the substrate peripheral portion processing room; a substrate moving and rotating tool (17) which grips the substrate and horizontally moves the substrate regarding the nozzle (N) and includes a tool to rotate the substrate (S); a substrate carrying tool (14) which carries the substrate (S) to the upper side of an initial stop position of the substrate moving and rotating tool (17); and a lifting tool (15) which takes the substrate carrying tool (14) and displaces the substrate on the substrate moving and rotating tool (17). [Reference numerals] (AA,DD) Left; (BB,EE) Up; (CC,FF) Right