首页> 外国专利> METHOD FOR REMOVING SI FROM Si-CONTAINING HYDROFLUORIC ACID WASTE LIQUID, METHOD FOR RECOVERING HYDROFLUORIC ACID FROM Si-CONTAINING HYDROFLUORIC ACID MIXED ACID WASTE LIQUID AND RECOVERY DEVICE

METHOD FOR REMOVING SI FROM Si-CONTAINING HYDROFLUORIC ACID WASTE LIQUID, METHOD FOR RECOVERING HYDROFLUORIC ACID FROM Si-CONTAINING HYDROFLUORIC ACID MIXED ACID WASTE LIQUID AND RECOVERY DEVICE

机译:从含硅氢氟酸废液中去除硅的方法,从硅含氢氟酸废液中回收氢氟酸的方法及回收装置

摘要

A removing method according to the present invention comprises a Si removing process which adds salts to a waste fluid containing hydrofluoric acid and Si and removes precipitates produced by the addition of the salts thereby obtaining Si-removed waste fluid. It is desirable to use one or more kinds of salts selected from the group consisting of metal fluoride salts and chloride metal salts for salts. According to the removing method, it is possible to effectively reduce or remove Si contained in Si-containing hydrofluoric acid waste fluid.;COPYRIGHT KIPO 2014
机译:根据本发明的去除方法包括硅去除工艺,该硅去除工艺将盐添加到含有氢氟酸和硅的废液中,并且去除通过添加盐而产生的沉淀物,从而获得去除硅的废液。期望使用选自金属氟化物盐和氯化物金属盐的一种或多种盐作为盐。根据该去除方法,可以有效地减少或去除含硅氢氟酸废液中所含的硅。; COPYRIGHT KIPO 2014

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