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RECYCLING METHOD FOR CARBON RECYCLED PARTS INTO CHAMBER OF MAKING POLY-CRYSTALLINE SILICON

机译:将回收的碳零件回收到制造多晶硅的腔室中的回收方法

摘要

The present invention relates to a method for recycling a carbon material part which has been used in a polycrystalline silicon generation chamber and which has been cut with polycrystalline silicon attached to the carbon material part. The method for recycling the carbon material part in the polycrystalline silicon manufacturing chamber comprises: a physical removal step of cutting polycrystalline silicon attached to the carbon material part using a cutting means; a chemical removal step of removing only polycrystalline silicon attached to the carbon material part by an etching method using chemicals; and a foreign substance removal step of removing foreign substances including residual moisture to complete the recycling of the carbon material part. The recycling method is characterized by impregnating the carbon material part with moisture, followed by etching the polycrystalline silicon attached to the carbon material part with chemicals; washing the carbon material part after etching the polycrystalline silicon; and primarily removing the foreign substances by forced exhaustion and secondarily removing residual foreign substances in a vacuum oven to recycle the carbon material part into an uncontaminated part.
机译:碳材料零件的回收方法技术领域本发明涉及一种碳材料零件的回收方法,该碳材料零件已在多晶硅产生室中使用,并且已经用附着在该碳材料零件上的多晶硅进行了切割。用于在多晶硅制造室中回收碳材料部分的方法包括:物理去除步骤,使用切割装置切割附着到碳材料部分的多晶硅。化学去除步骤,通过使用化学药品的蚀刻方法仅去除附着在碳材料部分上的多晶硅;异物去除步骤包括去除残留水分的异物,以完成碳材料零件的再循环。该回收方法的特征在于,使碳材料部件中充满水分,然后用化学药品蚀刻附着在碳材料部件上的多晶硅。刻蚀多晶硅后清洗碳材料部分;首先通过强制排气除去异物,其次在真空烘箱中除去残留的异物,以将碳材料部件再循环为未污染的部件。

著录项

  • 公开/公告号KR20140105910A

    专利类型

  • 公开/公告日2014-09-03

    原文格式PDF

  • 申请/专利权人 FINE CLEAN CO. LTD.;

    申请/专利号KR20130019675

  • 发明设计人 KIM GUK KWANG;

    申请日2013-02-25

  • 分类号C01B33/021;C01B31/02;

  • 国家 KR

  • 入库时间 2022-08-21 15:42:12

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