ANALYSIS DEVICE, ANALYSIS METHOD, OPTICAL ELEMENT USED IN SAME, AND ELECTRONIC EQUIPMENT AND OPTICAL ELEMENT DESIGN METHOD

摘要

Provided is an analysis device that is provided with a high-HSD optical element in which optical augmentation based on Plasmon excited by optical irradiation is high. The analysis device according to the present invention includes a metal layer, a light-transmitting layer that is formed on the metal layer for optical transmission, an optical element that contains a plurality of metal particles which are arranged at a first gap in a first direction on the light-transmitting layer and are arranged at a second gap in a second direction crossing the first direction, a light source that irradiates the optical element with incident light of linear polarized light having the same direction as the first direction, and a detector that detects light which is emitted from the optical element. Metal particle arrangement in the optical element satisfies the relationship in the following mathematical expression 1. [Mathematical Expression 1] P1P2=Q+P1 [Herein, P1 represents the first gap, P2 represents the second gap, and Q represents gap of a diffraction grid which is provided by the following mathematical expression 2 when each vibration number of localized Plasmon excited in a metal particle array is ω, permittivity of a metal constituting the metal layer is ε(ω), permittivity of the vicinity of the metal layer is ε, light speed in vacuum is c, and a thickness direction inclination angle of the light-transmitting layer as a glancing angle of the incident light is θ] [Mathematical Expression 2] (ω/c)·{ε·ε(ω)/(ε+ε(ω))}1/2=ε1/2·(ω/c)·sinθ+2mπ/Q(m=±1, ±2, ,).;COPYRIGHT KIPO 2014