首页> 外国专利> METHOD FOR CORRECTING TEMPERATURE DISTRIBUTION OF SEMICONDUCTOR DEVICE MEASURED BY INFRARED THERMAL IMAGING CAMERA AND SYSTEM USING THE SAME

METHOD FOR CORRECTING TEMPERATURE DISTRIBUTION OF SEMICONDUCTOR DEVICE MEASURED BY INFRARED THERMAL IMAGING CAMERA AND SYSTEM USING THE SAME

机译:红外热像仪测量的半导体装置温度分布的校正方法及使用该方法的系统

摘要

The present invention is provided to obtain an accurate distribution measurement on the surface of a semiconductor device by using an infrared thermal image camera. As a result, the disclosed invention obtains an accurate temperature distribution measurement on the surface of a semiconductor device by using an infrared thermal image camera by correcting factors which decrease accuracy by analyzing the factors which decrease accuracy in the temperature measurement of the semiconductor device.
机译:提供本发明,以通过使用红外热像仪在半导体器件的表面上获得准确的分布测量。结果,所公开的发明通过使用红外热像仪,通过分析降低半导体器件温度测量精度的因素来校正降低精度的因素,从而通过使用红外热像仪来获得半导体器件表面的精确温度分布测量。

著录项

  • 公开/公告号KR20140122124A

    专利类型

  • 公开/公告日2014-10-17

    原文格式PDF

  • 申请/专利权人 KOREA BASIC SCIENCE INSTITUTE;

    申请/专利号KR20130038823

  • 发明设计人 CHANG KI SOO;KIM GEON HEE;

    申请日2013-04-09

  • 分类号G01J5/20;G01J5/02;

  • 国家 KR

  • 入库时间 2022-08-21 15:41:59

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