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THE FORM AND METHOD OF ITS MANUFACTURE, AND THE ENLIGHTENING FILM

机译:其制造形式和方法,以及启蒙电影

摘要

1. A method of manufacturing a mold that has on its surface an inverted structure of the eye of a moth, having many recesses, the two-dimensional size of which, observed in the direction normal to the surface, is at least 50 nm and less than 500 nm, the method comprising the steps of :( a) anodizing the surface of the aluminum base to form a porous alumina layer that has many tiny recesses; (b) after step (a) the porous alumina layer is brought into contact with the etching solution, thereby enlarging the multiplier a series of minute depressions of the porous alumina layer; and (c) after step (b), further anodize the surface of the aluminum base to grow many tiny recesses, while the voltage applied in step (c) is higher than the voltage applied in step (a) .2. The method according to claim 1, wherein the numerical density of the smallest recesses after step (c) is less than the multiplied by 1.26 the numerical density of the smallest recesses after step (a). 3. The method according to claim 1 or 2, wherein step (a) and step (c) are performed in the same electrolytic solution. The method according to claim 3, wherein the growth rate in the thickness direction of the porous alumina layer in step (a) is lower than the growth rate in the thickness direction of the porous alumina layer in step (c). 5. The method according to claim 1, 2 or 4, further comprising, prior to step (a), step (d), at which the surface of the aluminum base is anodized to form a barrier-type alumina layer. The method according to claim 1, 2 or 4, the average value of the intervals of the centers of the multitude of tiny recesses is at least 180 nm. The method according to claim 1, 2 or 4,
机译:1.一种制造模具的方法,该模具在其表面上具有蛾眼的倒置结构,该结构具有许多凹部,在垂直于该表面的方向上观察,该凹部的二维尺寸至少为50nm,并且小于500nm,该方法包括以下步骤:(a)对铝基体的表面进行阳极氧化以形成具有许多微小凹口的多孔氧化铝层; (b)在步骤(a)之后,使多孔氧化铝层与蚀刻溶液接触,从而使乘数增加了多孔氧化铝层的一系列微小凹陷; (c)在步骤(b)之后,进一步阳极化铝基底的表面以生长许多微小的凹口,而步骤(c)中施加的电压高于步骤(a).2中施加的电压。 2.根据权利要求1所述的方法,其中,在步骤(c)之后的最小凹部的数值密度小于在步骤(a)之后的最小凹部的数值密度乘以1.26。 3.根据权利要求1或2的方法,其中步骤(a)和步骤(c)在相同的电解液中进行。 4.根据权利要求3所述的方法,其中,步骤(a)中的多孔氧化铝层的厚度方向上的生长速率低于步骤(c)中的多孔氧化铝层的厚度方向上的生长速率。 5.根据权利要求1、2或4所述的方法,还包括在步骤(a)之前的步骤(d),在所述步骤(d)中,对所述铝基体的表面进行阳极氧化以形成阻挡型氧化铝层。 5.根据权利要求1、2或4所述的方法,其中,多个微小凹部的中心的间隔的平均值为至少180nm。 5.根据权利要求1、2或4所述的方法,

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