首页> 外国专利> PROCESS CONTROL AND STABILIZATION SPEED POSLEDIFFUZIONNOGO (Diffusion of arsenic) COOLING low-voltage (~ 6V) silicon planar zener PRECISION STRUCTURES AND DEVICE FOR ITS IMPLEMENTATION

PROCESS CONTROL AND STABILIZATION SPEED POSLEDIFFUZIONNOGO (Diffusion of arsenic) COOLING low-voltage (~ 6V) silicon planar zener PRECISION STRUCTURES AND DEVICE FOR ITS IMPLEMENTATION

机译:过程控制和稳定速度扩散(砷的扩散)冷却低压(〜6V)硅平面齐纳二极管的精密结构及其实现装置

摘要

FIELD: process engineering.;SUBSTANCE: invention relates to solid-state microelectronics, particularly, to making of p-n-junctions in silicon by "sealed tube" tube, that is, evacuated sealed quartz ampoule. Here, after high-temperature diffusion annealing of said ampoule it is subjected to forced cooling by definite amount of water kept at definite temperature.;EFFECT: reproducible conditions of breakdown voltages in LV p-n-junctions, hence, higher yield of devices.;3 cl, 6 dwg
机译:技术领域本发明涉及固态微电子学,尤其涉及通过“密封管”管,即真空密封石英安瓿瓶在硅中制造p-n结。这里,在对所述安瓿进行高温扩散退火之后,将其通过一定量的保持在一定温度下的水进行强制冷却。效果:LV pn结中击穿电压的可再现条件,因此可以提高器件的产量; 3 cl,6 dwg

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