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DEVICE AND METHOD FOR CLEANING TECHNOLOGICAL SOLUTION BY GRAVITATIONAL DEPOSIT
DEVICE AND METHOD FOR CLEANING TECHNOLOGICAL SOLUTION BY GRAVITATIONAL DEPOSIT
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机译:利用重力沉积清洁技术解决方案的装置和方法
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摘要
1. Device (7) for cleaning a technological solution, including solids, containing: (a) a reservoir (10) having a base (12) and a side wall (14) forming an internal volume for containing the technological solution (22) and to ensure gravitational precipitation of solids in solution, resulting in a purified solution (30) in the upper region of the internal volume and a suspension (40) in the lower region of the internal volume; (b) the release of the purified solution (20) in or near the upper region of the internal volume for extract of cleaning solution; (c) release of slurry (16) within or near the bottom region of the inner volume for extracting slurry nonlimiting open to said inner volume; and (d) solid-moving elements extending laterally and fixed with respect to the reservoir (10), the solid-moving elements being in an internal volume for directing deposited solids and / or precipitating solids near a side wall or base to a motion path ( F) suspension extracted from the suspension. 2. The device according to claim 1, wherein the process solution is a Bayer process solution containing precipitated aluminum hydroxide. A device according to any one of claims 1 or 2, in which the solids transferring elements are arranged to direct solids near the wall (14; 12) of the reservoir (10) above the bottom of the reservoir to the trajectory of movement (F) of the suspension extracted from the outlet of the suspension (16 ).4. The device according to claim 1, in which the moving solids elements are placed to direct the deposited t
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