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INSTALLATION AND METHOD FOR PRECIPITATION single layer, multilayer and nanostructured wear-resistant coatings

机译:沉淀的安装和方法单层,多层和纳米结构的耐磨涂层

摘要

1. Apparatus for applying monolayer and multilayer nanostructured coatings obtained by means of chemical reactions between gaseous compounds of the elements from the group B, Ti, Al, Ga, Si, W, Mb, Mo, Ta, Cr, Zr, Hf and gaseous compounds of the elements from the group C, N, O, comprising: a. The reaction chamber divided into compartments with independent control of the chemical composition of the gas phase and the temperature in each compartment; b. The delivery system precisely metered amounts of gaseous precursor compounds of B, Ti, Al, Ga, Si, W, Mb, Mo, Ta, Cr, Zr, Hf in the reaction chamber; c. The delivery system precisely metered amounts of gaseous precursor compounds from the group of C, N, O in the reaction chamber; d. The delivery system precisely metered quantities of carrier gas from the group of Ar, He, H2, N2; e. The delivery system precisely metered amounts of etchant gas-HCl group, Cl2, HF; f. System removal of gaseous reaction products; g. Mechanism for moving the cover member between the compartments reciprocating or rotary tipa.2. Installation for coating according to claim 1, wherein the gaseous compounds are synthesized inside the installation of a solid or liquid compounds and elements from chemical reaktsiy.3. Installation for coating according to claims 1 and 2 to the activation of chemical reactions by thermal nagreva.4. Installation for coating according to claims 1 and 2 to the activation of chemical reactions plazmy.5 excitation. A method of coating using the apparatus of claims 1, 2, 3 and 4, comprising cleaning the surface of the coated strip by means of chemical etching in a gas atmosphere directly in the reaction kamere.6. A method of coating used to
机译:1.施加单层和多层纳米结构涂层的装置,该装置是通过气体元素中的B,Ti,Al,Ga,Si,W,Mb,Mo,Ta,Cr,Zr,Hf和气态元素之间的化学反应获得的C,N,O族元素的化合物,包括:a。反应室分为几个小室,分别控制气相的化学成分和每个小室的温度。 b。输送系统精确计量了反应室内的气态前驱体化合物B,Ti,Al,Ga,Si,W,Mb,Mo,Ta,Cr,Zr,Hf的量; C。输送系统精确计量了反应室中C,N,O组的气态前体化合物的量; d。输送系统精确计量来自Ar,He,H2,N2组的载气量; e。输送系统精确计量了蚀刻剂气体-HCl基团,Cl2,HF的量; F。系统去除气态反应产物; G。用于使盖构件在隔室之间往复运动或旋转的尖端的运动机构2。 2.根据权利要求1所述的用于涂覆的设备,其中,所述气态化合物在固体或液体化合物和元素的设备内部由化学反应合成。3。 3.根据权利要求1和2所述的用于通过热nagreva激活化学反应的涂层的设备。4。 3.根据权利要求1和2所述的用于活化化学反应的涂层的装置,激发5次。 5.使用权利要求1、2、3和4的设备进行涂覆的方法,包括直接在反应kamere中在气体气氛中通过化学蚀刻清洁涂覆条的表面。一种用于涂层的方法

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