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METHOD TO DETERMINE PARAMETER OF OPTICAL ANISOTROPY OF SIGMA MATERIAL OF CUBIC MONOCRYSTAL RELATED TO CLASS OF SYMMETRY m3m, OR 432
METHOD TO DETERMINE PARAMETER OF OPTICAL ANISOTROPY OF SIGMA MATERIAL OF CUBIC MONOCRYSTAL RELATED TO CLASS OF SYMMETRY m3m, OR 432
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机译:确定与对称性m3m有关的立方单晶硅的西格玛材料光学各向异性的方法,或432
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摘要
FIELD: measurement equipment.;SUBSTANCE: invention relates to the field of measurement equipment and may be used to determine the parameter of optical anisotropy of cubic crystals that relate to the class m3m, 43m or 432 of symmetry. The first version includes measurement of distribution of a local extent of depolarisation at two positions of the crystal, where maximum and minimum of depolarisation is observed. By integration of these distributions and divisions of one into another they determine the value ξ, and the sign of the parameter ξ is determined by behaviour of distribution of the local extent of depolarisation, which represents Maltese cross, during even rotation of the crystal from the position, in which the minimum is observed, into the position, in which they observe maximum (or vice versa) relative to direction of polarisation of laser radiation. In the second version they measure dependence of the angle of inclination of the Maltese cross φ relative to direction of polarisation of laser radiation from the angle of rotation of the crystal θ around the axis that matches with direction of radiation distribution, and on the basis of the dependence φ(θ), having achieved the maximum coincidence of the taken dependence with the open built theoretically, they determine both the sign of the parameter ξ, and its value.;EFFECT: invention makes it possible to determine the value of parameter of optical anisotropy ξ, and its sign.;2 cl, 3 dwg
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