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TARGET FOR TUNING AND DETERMINATION OF PARAMETERS OF OPTICAL-ELECTRONIC SYSTEMS WITH MATRIX PHOTODETECTING DEVICES AND METHOD OF ITS USAGE
TARGET FOR TUNING AND DETERMINATION OF PARAMETERS OF OPTICAL-ELECTRONIC SYSTEMS WITH MATRIX PHOTODETECTING DEVICES AND METHOD OF ITS USAGE
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机译:具有矩阵光电检测装置的光电系统参数的调整和确定目标及其使用方法
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摘要
FIELD: measurement equipment.;SUBSTANCE: target comprises rectangular narrow strokes arranged in parallel in a row Nvch, the width of which bVch is equal to the distance between them and is determined based on the following expression: bVch=F/f0*(m+δ), where: F - focus distance of a collimator; f0 - focus distance of a lens of the optic-electronic system (OES); m - size of a pixel of a matrix photodetecting device (MPDD); δ - a value, which is less than the size of the pixel multiple times and is equal: 0.01*mδ0.1*m. The number of narrow strokes Nvch≥is 2m/δ, and their height is h≥F/f0*5m. The target comprises at least one wide stroke arranged on the line of narrow strokes Nvch at its edges, such as NNch along the height equal to the height of narrow strokes Nvch, and along the width BnCh=(5…10)*bVch. The method includes formation of an actual image of the target in the plane of the MPDD, reproduction of a signal from narrow and wide strokes, according to which they perform mutual matching of the MPPD plane, the focal plane of the OES lens and the plane of the actual image of the target. The image from narrow and wide strokes is aligned along the direction of the line of MPPD pixels. They measure characteristics of the signal from narrow and wide strokes and determine the quality of OES tuning and its parameters.;EFFECT: provision of quality tuning of OES with MPPD, determination of its focus distance, its variation with higher accuracy and determination of temperature resolution.;7 cl, 6 dwg
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机译:领域:目标:目标包括平行排列在行N vch Sub>中的矩形窄笔触,其宽度b Vch Sub>等于它们之间的距离根据以下表达式确定:b Vch Sub> = F / f 0 * Sub>(m +δ),其中:F-准直仪的聚焦距离; f 0 Sub>-光学电子系统(OES)的透镜的焦距; m-矩阵光电检测装置(MPDD)的像素大小; δ-多次小于像素大小且等于0.01 * Sub> m <δ<0.1 * Sub> m的值。窄笔划N vch Sub>≥的数量为2m /δ,其高度为h≥F/ f 0 * Sub> 5m。目标包括至少一个在其边缘的窄笔划N vch Sub>的行上排列的宽笔划,例如N Nch Sub>,其高度等于窄笔划N的高度 vch Sub>,并沿宽度B nCh Sub> =(5…10) * Sub> b Vch Sub>。该方法包括在MPDD的平面中形成目标的实际图像,再现来自窄和宽行程的信号,据此,它们执行MPPD平面,OES透镜的焦平面和该平面的相互匹配。目标的实际图像。窄笔划和宽笔划的图像沿MPPD像素线的方向对齐。它们可以测量窄笔触和宽笔触信号的特性,并确定OES调谐的质量及其参数。效果:使用MPPD提供OES的质量调谐,确定其聚焦距离,其变化精度更高以及确定温度分辨率。; 7 cl,6 dwg
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