Method for applying an electrically conductive and optically transparent metal layer, a substrate with this metal layer and its use

摘要

Method for applying an electrically conductive and optically transparent metal layer with a layer thickness of less than 20 nm on a substrate, in which the deposition of the metal layer on the surface of the substrate under vacuum with an electric arc discharge between a target connected as a cathode, which is made from the metal of the metal layer to be formed is formed, and an anode is formed and operated with an electrical current of at least 1.5 kA, and that the ions formed in the arc discharge and used to deposit the metal layer are filtered through a filter, in the larger particles are separated, and that the diffusion of the ions on the substrate surface is reduced by subplantation of the ions in the substrate, characterized in that the layer is deposited in a structured manner in the layer plane.