首页> 外国专利> Applicator for use in studio for applying e.g. UV nail polish in nail model layer of finger, has reservoir comprising piston, and portion provided with feed mechanism for deflation of reservoir by moving piston

Applicator for use in studio for applying e.g. UV nail polish in nail model layer of finger, has reservoir comprising piston, and portion provided with feed mechanism for deflation of reservoir by moving piston

机译:用于工作室的涂药器,例如手指的指甲模型层中的UV指甲油,其储液器包括活塞,以及带有供料机构的部分,该供料机构用于通过移动活塞使储液器放气

摘要

The applicator (1) has a first portion (A) provided with an applicator head (2), and a second portion (B) for retaining a cylindrical reservoir (3) for a liquid medium. The reservoir comprises a piston (4), and a third portion (C) is provided with a feed mechanism for deflation of the reservoir by moving the piston. The head comprises an applicator tip for applying the liquid medium, where the tip is formed as a cross aperture with a spoon-shaped end or a cross aperture with a brush. The reservoir comprises an opening region (3a), and a feed plate (10) is movable along a pressing rod (7).
机译:施加器(1)具有设置有施加器头(2)的第一部分(A)和用于保持用于液体介质的圆柱形容器(3)的第二部分(B)。储存器包括活塞(4),第三部分(C)设有用于通过移动活塞使储存器放气的进给机构。头部包括用于施加液体介质的施加器尖端,其中该尖端形成为具有勺形端部的十字孔或具有刷子的十字孔。储存器包括开口区域(3a),并且进料板(10)可沿着压杆(7)移动。

著录项

  • 公开/公告号DE102012211885A1

    专利类型

  • 公开/公告日2014-01-09

    原文格式PDF

  • 申请/专利权人 NOWACK TETIANA;

    申请/专利号DE201210211885

  • 发明设计人 NOWACK TETIANA;

    申请日2012-07-06

  • 分类号A45D34/00;B05C17/00;

  • 国家 DE

  • 入库时间 2022-08-21 15:37:41

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