Door for closing loading opening of process chamber of epitaxial reactor used in semiconductor industry, has a closure plate heat-absorption reducing unit arranged towards the process chamber pointing surface of closure plate

摘要

The door comprises a closure plate, and a closure plate heat-absorption reducing unit arranged towards the process chamber pointing surface of the closure plate. The heat absorption surface of the heat-absorption reducing unit is formed as a heat radiation-reflecting surface. The heat radiation-reflecting surface has a roughness of 1 mu m or less and is made of a layer of gold, silver or nickel. The distance between a sealing plate and a heat shield is sealed with a sealing ring.