首页> 外国专利> Use of a composition comprising diethylzinc and a tricyclic aryl compound, in chemical vapor deposition process for depositing zinc oxide film, such as conductive transparent oxide film, which is useful to manufacture flat panel display

Use of a composition comprising diethylzinc and a tricyclic aryl compound, in chemical vapor deposition process for depositing zinc oxide film, such as conductive transparent oxide film, which is useful to manufacture flat panel display

机译:包含二乙基锌和三环芳基化合物的组合物在化学气相沉积过程中用于沉积氧化锌膜(例如导电透明氧化物膜)的用途,该氧化锌膜可用于制造平板显示器

摘要

Use of a composition comprising a diethylzinc and a tricyclic aryl compound (X), in a process for depositing a zinc oxide film, is claimed. Use of a composition comprising a diethylzinc and a tricyclic aryl compound of formula (X), in a process for depositing a zinc oxide film, is claimed. R1 : H, alkyl, an olefin conjugated with aromatic ring, or optionally substituted 1-12C aryl. An independent claim is included for depositing the zinc oxide film, comprising (a) positioning a substrate in a deposition chamber, (b) vaporizing the composition, and (c) introducing, into the deposition chamber, a gaseous mixture comprising an oxygen source, such as water or an alcohol optionally containing less than 5C, and a doping product consisting of trimethylaluminum, triethylaluminum, tri-propylaluminum, diethyl ethoxide, dimethyl isopropoxide, tris(acetylacetonate) aluminum, tris(acetate) aluminum, tris(tetramethylheptadionate) aluminum, aluminum alkoxide, aluminum chloride, tris(dimethylamino) aluminum, trimethylgallium, triethylgallium, tri-propylgallium, diethylgallium ethoxide, dimethyl gallium, isopropoxide, tris(acetylacetonate)gallium, tris(acetate)gallium, tris(tetramethylheptadionate)gallium, gallium alkoxide, gallium chloride, tris(dimethylamino)gallium, diborane, trimethylborane, triethylborane, trimethylborate, tri-isopropylborate and 1,3,5-trimethylborazine. [Image].
机译:要求保护包含二乙基锌和三环芳基化合物(X)的组合物在沉积氧化锌膜的方法中的用途。要求保护包含二乙基锌和式(X)的三环芳基化合物的组合物在沉积氧化锌膜的方法中的用途。 R 1:H,烷基,与芳环共轭的烯烃或任选取代的1-12C芳基。包括用于沉积氧化锌膜的独立权利要求,其包括:(a)将衬底放置在沉积室中;(b)蒸发组合物;以及(c)将包含氧气源的气态混合物引入沉积室中;例如水或可选地包含低于5C的醇,以及由三甲基铝,三乙基铝,三丙基铝,乙醇二乙酯,异丙醇二甲酯,三(乙酰丙酮)铝,三(乙酸)铝,三(四甲基庚二酸)铝组成的掺杂产物,醇铝,氯化铝,三(二甲基氨基)铝,三甲基镓,三乙基镓,三丙基镓,乙醇二乙基镓,二甲基镓,异丙醇,三(乙酰丙酮酸)镓,三(乙酸)镓,三(四甲基庚二酸)镓,醇镓,镓氯化物,三(二甲基氨基)镓,乙硼烷,三甲基硼烷,三乙基硼烷,硼酸三甲酯,硼酸三异丙酯和1,3,5-三甲基硼嗪。 [图片]。

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