首页> 外国专利> COATING METHOD OF RADIATION SHIELDING ROOM TEMPERATURE CURABLE ORGANOPOLYSILOXANE COMPOSITION AND STRUCTURE COATED BY THE COATING METHOD

COATING METHOD OF RADIATION SHIELDING ROOM TEMPERATURE CURABLE ORGANOPOLYSILOXANE COMPOSITION AND STRUCTURE COATED BY THE COATING METHOD

机译:辐射屏蔽室温度可固化有机硅氧烷的涂层方法及涂层方法

摘要

PROBLEM TO BE SOLVED: To provide a coating method which has preferable operability and curability and can secure a cured thickness and radiation ray shielding property, and to provide a structure which is coated by the coating method and is suited for radiation ray shielding use as the structure in a radiation contamination region.;SOLUTION: A coating method includes a process in which an arbitrary wall surface of a structure is coated with a radiation ray shielding room temperature curable organopolysiloxane composition containing the following (A) to (D) components by using a coating spray system and a coated film is cured at room temperature: (A) diorganopolysiloxane of which molecular chain both terminals are closed by hydroxide group and/or hydrolyzable group; (B) barium sulfate; (C) silica having a BET specific surface area of 10 m2/g or more; (D) silane and/or partially hydrolyzed condensate which has at least two hydrolyzable groups in one molecule represented by R1aSiZ4-a (R1 is mono-valent hydrocarbon group having the number of carbon atoms of 1 to 12, Z is independently hydrolyzable group, a is an integer of 0 to 2).;COPYRIGHT: (C)2016,JPO&INPIT
机译:解决的问题:提供一种涂布方法,其具有优选的可操作性和可固化性,并且可以确保固化的厚度和放射线屏蔽性,并且提供一种通过该涂布方法进行涂布的结构,该结构适合于用作放射线屏蔽用途。解决方案:涂覆方法包括以下步骤:通过使用以下方法,在结构的任意壁表面上涂覆含有以下(A)至(D)成分的辐射屏蔽室温可固化有机聚硅氧烷组合物涂料喷涂系统和涂膜在室温下固化:(A)二有机聚硅氧烷,其分子链的两个末端均被氢氧基和/或可水解基团封闭; (b)硫酸钡; (C)BET比表面积为10m 2 / g或更高的二氧化硅; (D)以R 1 a SiZ 4-a 表示的一个分子中具有至少两个可水解基团的硅烷和/或部分水解的缩合物(R 1 是碳原子数为1至12的一价烃基,Z独立为可水解基团,a为0至2的整数).;版权所有:(C)2016 ,JPO&INPIT

著录项

  • 公开/公告号JP2015182050A

    专利类型

  • 公开/公告日2015-10-22

    原文格式PDF

  • 申请/专利权人 SHIN ETSU CHEM CO LTD;

    申请/专利号JP20140062857

  • 发明设计人 TESHIGAWARA MAMORU;SAKAMOTO TAKAFUMI;

    申请日2014-03-26

  • 分类号B05D7/24;B05D7/00;B05D5/00;

  • 国家 JP

  • 入库时间 2022-08-21 15:35:34

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