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PROJECTOR SYSTEM, STEREOSCOPIC MOLDING GENERATION APPARATUS USING PROJECTOR SYSTEM AND STEREOSCOPIC MOLDING GENERATION METHOD

机译:投影仪系统,使用该投影仪系统的立体模具成型装置以及立体模具成型方法

摘要

PROBLEM TO BE SOLVED: To provide a projector system capable of changing properties of objects to be irradiated in parallel at the same time in a three-dimensional region by utilizing an ability to perform projection to a deep region to be projected, and further to provide a stereoscopic molding generation apparatus using the projector system and a stereoscopic molding generation method.;SOLUTION: A projector system 2 and a stereoscopic molding generation apparatus 500 having the projector system 2 have a light emission section 10 emitting light for changing properties of objects to be irradiated and further comprise: a light emission adjustment mechanism 100 allowing an emission angle of the light to be adjusted; and a circuit device 80 controlling an emission position and the emission angle of the light. The light passing through the light emission adjustment mechanism 100 is irradiated to a region to be irradiated PD in an irradiation-enabled region PX. On this account, the properties of the objects to be irradiated MP disposed in the region to be irradiated PD can be changed (cured) in parallel at the same time, and a stereoscopic molding can be generated in a short period of time.;COPYRIGHT: (C)2016,JPO&INPIT
机译:解决的问题:提供一种投影仪系统,该投影仪系统能够通过利用对要投影的较深区域进行投影的能力来同时改变在三维区域中并行照射的物体的特性,并且进一步提供解决方案:投影仪系统2和具有该投影仪系统2的立体造型生成装置500具有发光部10,该发光部10发出用于改变被摄体的特性的光。照射装置还包括:发光调节机构100,其允许调节光的发射角度;以及电路装置80控制光的出射位置和出射角。穿过发光调整机构100的光被照射到可照射区域PX中的被照射区域PD。因此,可以同时并行地改变(固化)布置在被照射区域PD中的被照射物体MP的特性,并且可以在短时间内产生立体造型。 :(C)2016,JPO&INPIT

著录项

  • 公开/公告号JP2015182413A

    专利类型

  • 公开/公告日2015-10-22

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20140063250

  • 发明设计人 MAKIGAKI TOMOHIRO;MIYASAKA KOICHI;

    申请日2014-03-26

  • 分类号B29C67/00;

  • 国家 JP

  • 入库时间 2022-08-21 15:35:32

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