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THIN FILM PLATING METHOD IMPROVING ANTICORROSION

机译:改善反腐蚀的薄膜镀膜方法

摘要

PROBLEM TO BE SOLVED: To solve problems that, for example, in multilayer plating using only a DC power supply, a plating layer becomes thicker.;SOLUTION: A metallic substrate serving as a cathode is immersed in an electrolyte, electrical plating using a high speed current inversion power supply and electrical plating using a DC power supply, are alternately performed for performing multilayer plating, and plating layers are sequentially formed on minute, uniform, and thin plating layers, thereby the multilayer plating becomes thinner, overall.;COPYRIGHT: (C)2016,JPO&INPIT
机译:解决的问题:为了解决例如仅使用直流电源的多层镀覆时镀层变厚的问题。解决方案:将用作阴极的金属基板浸入电解液中,使用高电流进行电镀交替进行高速电流反转电源和使用DC电源的电镀以执行多层电镀,然后依次在微小,均匀且薄的电镀层上形成电镀层,从而使多层电镀总体上变得更薄。 (C)2016,日本特许厅&INPIT

著录项

  • 公开/公告号JP2015190024A

    专利类型

  • 公开/公告日2015-11-02

    原文格式PDF

  • 申请/专利权人 CHIYODA KIKI HANBAI KK;

    申请/专利号JP20140069239

  • 发明设计人 SASAKI TOKUAKI;ITO AKIRA;ITO TAKASHI;

    申请日2014-03-28

  • 分类号C25D5/18;C25D5/10;C25D21/12;

  • 国家 JP

  • 入库时间 2022-08-21 15:34:43

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