SELF-ORGANIZING COMPOSITION FOR PATTERN FORMATION AND PATTERN FORMATION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a self-organizing composition for pattern formation which can perform development by using an alcohol-based solvent or an alkali aqueous solution and can form a sufficiently fine pattern.;SOLUTION: There is provided a self-organizing composition for pattern formation which comprises a first polymer having a structural unit containing an acidic group and a second polymer other than the first polymer, where the content ratio of the structural unit is 10 mol% or more based on the total structural units of the first polymer and the first polymer has a dissolution rate in 2.38 mass% tetramethylammonium hydroxide aqueous solution at 23°C of 10 nm/min or more. The acidic group is preferably at least one kind selected from the group consisting of a phenolic hydroxy group, a carboxyl group, a sulfonamide group and a sulfo group.;COPYRIGHT: (C)2015,JPO&INPIT