首页> 外国专利> Photovoltaic devices incorporating chalcogenide thin films electrically interposed between pnictide-containing absorber and emitter layers

Photovoltaic devices incorporating chalcogenide thin films electrically interposed between pnictide-containing absorber and emitter layers

机译:包含硫族化物薄膜的光伏器件,这些硫属化物薄膜电插在含磷化物的吸收层和发射极层之间

摘要

The present invention provides a strategy for improving the quality of the insulating layer in MIS and SIS devices where the insulating layer interacts with at least one pnictide-containing film. The principles of the present invention are at least partially due to the discovery that very thin (20 nm or less) insulating films including chalcogenides such as i-ZnS are surprisingly superior tunnel barriers in MIS and SIS devices incorporating pnictide semiconductors. Based. In one embodiment, the present invention provides a semiconductor region including at least one pnictide semiconductor and an insulating region electrically connected to the semiconductor region, the region including at least one chalcogenide within a range of 0.5 nm to 20 nm. The present invention relates to a photovoltaic device comprising an insulating region having a thickness, and a rectifying region electrically connected to the semiconductor region such that the insulating region is electrically interposed between the current collector region and the semiconductor region . [Selection] Figure 1
机译:本发明提供了一种策略,用于提高MIS和SIS装置中的绝缘层的质量,其中,MIS和SIS装置中,绝缘层与至少一个含肽的膜相互作用。本发明的原理至少部分地是由于发现包括硫族化物例如i-ZnS的非常薄的(20nm或更小)绝缘膜是在掺入有磷化物半导体的MIS和SIS装置中令人惊讶地优越的隧道势垒。基于。在一个实施例中,本发明提供了一种半导体区域,该半导体区域包括至少一个磷化物半导体和电连接到该半导体区域的绝缘区域,该区域包括在0.5nm至20nm范围内的至少一个硫族化物。光伏器件技术领域本发明涉及一种光伏器件,该光伏器件包括:具有厚度的绝缘区域;以及整流区域,该整流区域电连接至半导体区域,使得该绝缘区域电插入在集流体区域与半导体区域之间。 [选择]图1

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