首页> 外国专利> COATING LIQUID FOR FORMING DIFFUSION PREVENTION LAYER, DIFFUSION PREVENTION LAYER USING THE SAME, METHOD OF FORMING THE SAME, PROCESS OF MANUFACTURING A SEMICONDUCTOR SUBSTRATE HAVING A DOPANT DELUSION LAYER, AND PROCESS OF MANUFACTURING SOLAR CELL

COATING LIQUID FOR FORMING DIFFUSION PREVENTION LAYER, DIFFUSION PREVENTION LAYER USING THE SAME, METHOD OF FORMING THE SAME, PROCESS OF MANUFACTURING A SEMICONDUCTOR SUBSTRATE HAVING A DOPANT DELUSION LAYER, AND PROCESS OF MANUFACTURING SOLAR CELL

机译:形成扩散防止层的涂布液,使用相同层的扩散防止层,形成相同层的方法,制造具有掺杂剂扩散层的半导体基板的过程以及制造太阳能电池的过程

摘要

PROBLEM TO BE SOLVED: To provide a coating liquid for forming a diffusion prevention layer excellent in dopant diffusion prevention characteristics, process of manufacturing a semiconductor substrate having a dopant diffusion layer using the same, and a process of manufacturing a solar cell.;SOLUTION: The coating liquid for forming a diffusion prevention layer for preventing dopants from being diffused by coating on a surface of a semiconductor substrate includes (A) and (B) components described as follows is used: (A) silicon oxide fine particulate and (B) dispersant.;COPYRIGHT: (C)2015,JPO&INPIT
机译:解决的问题:提供用于形成防掺杂剂扩散特性优异的防扩散层的涂布液,使用该涂布液的具有掺杂剂扩散层的半导体基板的制造方法以及太阳能电池的制造方法。形成用于形成防止扩散层的涂布液的涂布液包括:(A)和(B)如下所述的成分:(A)氧化硅微粒和(B),所述扩散防止层通过涂布在半导体基板的表面上而扩散。分散剂;版权:(C)2015,日本特许厅

著录项

  • 公开/公告号JP2014232813A

    专利类型

  • 公开/公告日2014-12-11

    原文格式PDF

  • 申请/专利权人 NIPPON SYNTHETIC CHEM IND CO LTD:THE;

    申请/专利号JP20130113360

  • 发明设计人 SATO HIROAKI;

    申请日2013-05-29

  • 分类号H01L21/22;H01L31/06;H01L21/225;H01L21/316;

  • 国家 JP

  • 入库时间 2022-08-21 15:31:53

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